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BeLuxe

Purito SEOUL - Wonder Releaf Centella Daily Sun Lotion

Purito SEOUL - Wonder Releaf Centella Daily Sun Lotion

$20.00 USD
$20.00 USD
Sale Sold out

 

  • A moisturizer-like sunscreen offers SPF50+ PA++++ sun protection with a non-sticky texture, made for sensitive skin.

     

  • Korean Centella Asiatica offers skin soothing, Brown Algae Extract offers anti-pollution, and Hyaluronic Acid maintains hydration.

     

  • A fast-absorbing, weightless formula that leaves the skin moisturized and dewy without any greasy residue.

     

  • Crafted to shield the skin from urban stressors, it effectively blocks harmful UV rays while creating a barrier against pollutants like fine dust.

     

  • SPF/PA Clinical Study Results for sun protector factor and strong urban defense with the fine dust adhesion prevention test and two skin irritation tests completed.

  • How to use:
    1. Apply generously 15 minutes before sun exposure.

    2. Reapply every two hours or as necessary and immediately after extensive sweating.
  • Ingredients 
  • Water, Dibutyl Adipate, Propanediol, Dipropylene Glycol, Centella Asiatica Extract (30,108 ppm), Ethylhexyl Triazone, Terephthalylidene Dicamphor Sulfonic Acid, Isododecane, Niacinamide, Sorbitan Sesquioleate, Diethylamino hydroxybenzoyl hexyl benzoate, Tromethamine, Ecklonia Cava Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Hydrolyzed Sodium Hyaluronate, Sodium Hyaluronate, Potassium Hyaluronate, Hydroxypropyltrimonium Hyaluronate, Sodium Hyaluronate Crosspolymer, Sodium Acetylated Hyaluronate, Caprylyl Methicone, Glycerin, Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine, Benzotriazolyl Dodecyl p-Cresol, Polysilicone-15, Polymethylsilsesquioxane, Silica, 1,2-Hexanediol, Glyceryl Stearate, Ammonium Acryloyldimethyltaurate/VP Copolymer, Cetearyl Alcohol, Hydroxyacetophenone, Potassium Cetyl Phosphate, Palmitic Acid, Stearic Acid, Polyacrylate Crosspolymer-6, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Caprylyl Glycol, Dipotassium Glycyrrhizate, Allantoin, Panthenol, Adenosine, Ethylhexylglycerin, Myristic Acid, Butylene Glycol, t-Butyl Alcohol

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